Hyderabad : Indian Institute of Technology Hyderabad has been ranked No. 8 among all Engineering institutes as per the India Rankings 2019 conducted by the National Institutional Ranking Framework (NIRF), Ministry of Human Resource Development, Government of India. The Institute has improved its position from last year when it was ranked #9.
The Institute has also been ranked #10 in the first edition of Atal Ranking of Institutions on Innovation Achievements (ARIIA) introduced this year. Atal Ranking of Institutions on Innovation Achievements (ARIIA) is an initiative of Ministry of Human Resource Development (MHRD), Government of India, to systematically rank all major higher educational institutions and universities in India on indicators related to “Innovation and Entrepreneurship Development” amongst students and faculties.
The Institute ranked #22 in the ‘Overall’ category this year as well.
Hon’ble President of India Shri. Ram Nath Kovind announced the results for NIRF 2019 and ARIIA 2019 at a function held today, 8th April 2019, in Vigyan Bhawan at New Delhi.
Speaking about the rankings, Prof U.B. Desai, Director, IIT Hyderabad, said, “It is indeed a matter of pride for IITH to be ranked 8th in engineering — this is the 4th year in a row that IITH has been ranked in top 10. It also another proud moment for IITH to be ranked 10th in the first year of ARIIA ranking. All the credit goes to the faculty and students of IITH for this fantastic achievement.”
Under ‘Engineering’ category of NIRF 2019 this year, the Institute scored well in all parameters: 78.91 in ‘Teaching, Learning and Resources’, 49.18 in ‘Research and Professional Practices’, 71.71 in ‘Graduation Outcome’, 56.21 in ‘Outreach and Inclusivity’ and 55.38 in ‘Perception’.
NIRF was started in 2015. It is a methodology to rank educational institutions across the country. The parameters used for ranking broadly cover “Teaching, Learning and Resources,” “Research and Professional Practices,” “Graduation Outcome,” “Outreach and Inclusivity,” and “Perception”.